Content tagged with: Electrodeposition and Electron-beam lithographyFound 3 matches.
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Filter content on additional tags:Focused ion beam, Reactive ion etching, Sputtering, Wet etching, 3D lithography, Adsorption, Advanced photolithography, Atomic force probe writing, Block copolymer lithography, Chemical vapor deposition (CVD), Cluster beam coating, Colloidal crystal template lithography, Contact printing, Dip-pen nanolithography, Electro-less deposition, Embossing/Imprinting, Evaporation, Extreme ultraviolet (EUV) lithography, Focused ion beam (FIB) lithography, Inert ion beam etching, Interference lithography, Ion beam writing, Ion projection lithography, Microfluidic deposition, Molecular beam epitaxy (MBE), Multilayer film processes, Nanofiber precipitation, Nanoparticle spray coating, Plasmonic lithography, Scanning tunneling microscope chemical vapor deposition (STM CVD), Spin coating, Thin film extrusion, X-ray lithography, Atomic force microscopy (AFM), Co-deposition, Current-voltage (IV), Cyclic voltammetry (CV), Energy dispersive x-ray spectroscopy (EDS), Focused ion beam (FIB), Hall effect, Impedance spectroscopy (IS), Intercalated materials, LEED, Magnetic, Magnetic force microscopy (MFM), Nanomagnet arrays, Parametric device characterization, Scanning tunneling microscopy (STM), Structural, Thin films
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This project is supported by theNational Science FoundationCMMI-1025020Center for Hierarchical Manufacturing