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Content tagged with: Block copolymers and Nanopatterning/Lithography
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Replica Molding at the Subnanometer Scale Using Elastomeric Polymers

Dec. 2010- Replica molding of patterns having <10 nm features remains a significant nanomanufacturing challenge since the feature sizes at these length scales approach those of the monomers typically used for replication. In this investigation, Elhadj and colleagues demonstrate that polymers having an average radius of ~1 nm, average bond length of ~0.2 nm, and average distance between cross links of ...

Strategies for Integration of Directed Self-Assembly with Optical Lithography

Aug. 2010- Directed self-assembly (DSA) of nanoscale devices commonly combines self-assembling materials such as block copolymers (BCPs) with lithographically defined pre-patterned surfaces. To date, the most significant impact of DSA has been for the fabrication of nanoimprint master molds for bit-patterned magnetic storage media. Moving to semiconductor integrated circuit fabrication requires DSA ...

Multi-scale Directed Assembly of Polymer Blends Using Chemically Functionalized Nanotemplates

May. 2010- NSF Center for High-rate Nanomanufacturing, Northeastern University, University of Massachusetts Lowell Nanoscale patterned polymeric structures with multiple surface functionalities can be used for the fabrication of microphotonic arrays, biosensors, and semiconductor integrated circuits. The directed assembly of polymer blends into nanoscale structures offers an advantage in that a wide array ...

Hierarchical Metal Oxide Films

Feb. 2010- NSF Center for Hierarchical Manufacturing (CHM), University of Massachusetts Amherst Patterned metal oxide films having well-defined order and morphology are essential device layers in microelectronics, photovoltaics, and microfluidics for separations and sensors.  In a typical fabrication process sequence, a planar metal oxide film is deposited, coated with multi-layer resist structures, ...

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A Simple Top-Down/Bottom-Up Approach to Sectored, Ordered Arrays of Nanoscopic Elements Using Block Copolymers

A top-down/bottom-up approach is demonstrated by combining electron-beam (e-beam) lithography and a solvent annealing process. Micellar arrays of polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) with a high degree of lateral order can be produced on a surface where sectoring is defined by e-beam patterning. The e-beam is used to crosslink the block copolymer (BCP) film immediately after ...

Accessibility of cylindrical channels within patterned mesoporous silica films using nanoparticle diffusion

Mesoporous silica films with well ordered nanochannels (approximately 7 nm in diameter) oriented parallel to the substrate were synthesized using supercritical carbon dioxide mediated silica deposition within templates comprised of triblock copolymers blended with strongly associating homopolymers. The films were patterned at the device level by conventional lithography and etched to yield ...

Block copolymer self-assembly in chemically patterned squares

The self-assembly of block copolymers thin films laterally confined within square geometries that are incompatible with the bulk packing symmetry of the block copolymer microdomains is investigated. The lateral confinement is provided by chemical patterns made by oxidation nanolithography of octadecyltrichlorosilane-coated silicon surfaces. We find that the size and shape of the confinement ...

Fabrication and Characterization of Large-Area, Semiconducting Nanoperforated Graphene Materials

We demonstrate the fabrication of nanoperforated graphene materials with sub-20-nm features using cylinder-forming diblock copolymer templates across >1 mm2 areas. Hexagonal arrays of holes are etched into graphene membranes, and the remaining constrictions between holes interconnect forming a honeycomb structure. Quantum confinement, disorder, and localization effects modulate the electronic ...

From Nanorings to Nanodots by Patterning with Block Copolymers

We demonstrate three different transfer patterns that can be achieved by use of a surface reconstructed block copolymer film where metal is evaporated onto the surface of the film, providing the contrast. Thin films of diblock copolymers having cylindrical microdomains oriented normal to the surface with long-range lateral order were used. Solvent reconstruction of the film, followed by a ...

Simple Fabrication of Micropatterned Mesoporous Silica Films Using Photoacid Generators in Block Copolymers

Mesoporous metal oxide films have been the subject of extensive research because of their potential utility in sensors,(1)a microfluidics,(1)b microelectronics, optoelectronics, microelectromechanical systems,(1)c and catalysis.(1)d Many of these applications require the patterning of the mesoporous device layers to integrate other components necessary for intended applications. Patterning of ...

The NNN Newsletter

Welcome to the inaugural newsletter of the National Nanomanufacturing Network. Includes NNN Expert Review: The Frontline of Nanomanufacturing; NNN Highlight: Novel Nanopositioning Device with Increased Degrees of Freedom; and NNN Feature: An Interview with Vince Rotello.