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Event: 'SPIE Advanced Lithography'

Conference
Date: Sunday, February 22, 2009 At 08:00:00 AM
Duration: 6 Days
Contact Info:
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SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.

See presentations on:

  • Alternative Lithographic Technologies
  • Metrology, Inspection, and Process Control for Microlithography
  • Advances in Resist Materials and Processing Technology
  • Optical Microlithography
  • Design for Manufacturability through Design-Process Integration

San Jose, CA



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