SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.
See presentations on:
Alternative Lithographic Technologies
Metrology, Inspection, and Process Control for Microlithography
Advances in Resist Materials and Processing Technology
Design for Manufacturability through Design-Process Integration