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SPIE ADVANCED LITHOGRAPHY 2013

Conference
Sunday, February 24, 2013 to Thursday, February 28, 2013

Many of the industry's top semiconductor suppliers, integrators, and manufacturers take part in the annual SPIE Advanced Lithography exhibition. For 36 years SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications.

Featured technologies at Advanced Lithography include:
•Etch Technology for nanopatterning •Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET •Metrology, inspection, OPC, and process control •Design and manufacturing software •Materials and chemicals •Imaging equipment •Lasers •Resist materials and processing •Nano-imprint •IC and chip fabrication •Nanoscale imaging

SAN JOSE, CA

Contact:
Contact the SPIE sales team
In America, Asia, and rest of the world
Teresa Roles-Meier
Tel: +1 360 685 5445
Fax: +1 360 647 1445
teresar@spie.org

In Austria, Belgium, Germany, Italy, Liechtenstein, Luxembourg, Netherlands, and Switzerland
Hermann Doster
Tel: +49 (0)7025/841 806
Fax: +49 (0)7025/842 983
hermann@spieeurope.org

teresar@spie.org