The 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics is the seventh in a series that began in 1995. It emphasizes the frontiers and innovation in characterization and metrology of nanoelectronics. We bring together scientists and engineers interested in all aspects of the characterization technology needed for nanoelectronic materials and device research, development, and manufacturing. The conference summarizes major issues and provides critical reviews of important semiconductor techniques needed as the semiconductor industry moves to silicon nanoelectronics and beyond.
Albany, NY