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		<title>InterNano - Nanomanufacturing News</title>
		<description>InterNano is an open-source online information clearinghouse for the nanomanufacturing research and development (R&amp;D) community in the United States. It is designed provide this community with an array of tools and collections relevant to its work and to the development of viable nanomanufacturing applications.</description>
		<link>http://www.internano.org</link>
		<lastBuildDate>Wed, 10 Mar 2010 01:28:07 +0100</lastBuildDate>
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			<title>InterNano</title>
			<link>http://www.internano.org</link>
			<description>InterNano is an open-source online information clearinghouse for the nanomanufacturing research and development (R&amp;D) community in the United States. It is designed provide this community with an array of tools and collections relevant to its work and to the development of viable nanomanufacturing applications.</description>
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			<title>SWeNT Receives Innovation Award for Carbon Nanotubes</title>
			<link>http://www.internano.org/content/view/364/251/</link>
			<description> SouthWest NanoTechnologies Inc. (SWeNT) has received the prestigious Frost   Sullivan 2010 North American Technology Innovation Award in Carbon Nanotubes.  The company was honored with this highly coveted award for its innovative CoMoCAT&amp;reg; nanotube production process by this global research organization, which monitors more than 300 industries and 250,000 companies with more than 1,800 analysts.</description>
			<category>News - Press Releases</category>
			<pubDate>Tue, 02 Mar 2010 11:05:27 +0100</pubDate>
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			<title>National Nanotechnology Initiative 2011 Budget and Signature Initiatives</title>
			<link>http://www.internano.org/content/view/363/251/</link>
			<description> The National Nanotechnology Initiative has released its 2011 Supplement (http://www.nano.gov/NNI_2011_budget_supplement.pdf)  to the President&amp;#39;s Budget. In his introductory letter, Presidential Science and Technology Advisor John Holdren notes that  Nanotechnology R D constitutes a core building block of innovation that will ultimately accelerate job creation and transform many sectors of our economy through commercialization. </description>
			<category>News - NNN Features</category>
			<pubDate>Sun, 28 Feb 2010 01:00:00 +0100</pubDate>
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			<title>Two Approaches to Large-Area Graphene Synthesis For Device Quality Materials</title>
			<link>http://www.internano.org/content/view/362/239/</link>
			<description>Li and Hofrichter offer two approaches for large-area synthesis of graphene on substrates with potential for device integration.  </description>
			<category>Resources - Expert Reviews</category>
			<pubDate>Fri, 26 Feb 2010 01:00:00 +0100</pubDate>
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			<title>Hierarchical Metal Oxide Films</title>
			<link>http://www.internano.org/content/view/361/280/</link>
			<description>NSF Center for Hierarchical Manufacturing (CHM), University of Massachusetts Amherst Patterned metal oxide films having well-defined order and morphology are essential device layers in microelectronics, photovoltaics, and microfluidics for separations and sensors.  In a typical fabrication process sequence, a planar metal oxide film is deposited, coated with multi-layer resist structures, patterned by optical lithography, etched, stripped, ashed, and cleaned to generate a patterned oxide film.  This cycle often consists of 10 or more process steps.  Moreover, the resolution of current lithography and etch techniques limit the minimum feature size precluding the direct fabrication of complex geometric structures. </description>
			<category>Resources - Testbeds</category>
			<pubDate>Fri, 26 Feb 2010 16:11:42 +0100</pubDate>
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			<title>Thermal Dip Pen Nanolithography for Direct Writing of Polymer-NanoParticle Composites</title>
			<link>http://www.internano.org/content/view/359/239/</link>
			<description>Lee et. al. demonstrated a maskless, additive approach for direct writing of a range of NP&amp;ndash;polymer compositions using thermal dip-pen nanolithography (tDPN). This technique represents a facile strategy for deposition of a wide range of NP composite materials in order to create dense nanopatterned films.</description>
			<category>Resources - Expert Reviews</category>
			<pubDate>Tue, 23 Feb 2010 01:00:00 +0100</pubDate>
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			<title>Molecular Imprints Introduces First Nanopatterning Solution For Hard Disk Drive Volume ...</title>
			<link>http://www.internano.org/content/view/358/251/</link>
			<description> Molecular Imprints, Inc., the market and technology leader for nanopatterning systems and solutions, introduced the NuTera HD7000&amp;mdash;its next-generation Jet and Flash&amp;trade; Imprint Lithography (J-FIL&amp;trade;) platform for the hard disk drive (HDD) industry.  Representing the industry&amp;#39;s first nanopatterning system specifically designed for patterned media pilot- and volume-manufacturing, the NuTera HD7000 enables sub-20nm lithography at production speeds and provides the low cost of ownership (CoO) that HDD manufacturers require in order to economically extend their areal density roadmaps to well beyond one terabit per square inch.</description>
			<category>News - Press Releases</category>
			<pubDate>Mon, 22 Feb 2010 10:30:57 +0100</pubDate>
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			<title>Implications of Supramolecular Templating of Thick Mesoporous Titania Films for Dye-Sensitized ...</title>
			<link>http://www.internano.org/content/view/357/239/</link>
			<description>Zhang et.al., reported on an approach to synthesize thick mesoporous inorganic oxide films in order to harvest more  incident solar radiation, thereby enhancing the efficiency of the solar cell.</description>
			<category>Resources - Expert Reviews</category>
			<pubDate>Thu, 11 Feb 2010 11:33:57 +0100</pubDate>
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			<title>Nanostructured Solar Cells Have Improved Charge Collection and Self Cleaning Properties</title>
			<link>http://www.internano.org/content/view/356/239/</link>
			<description>Zhu, et. al., report on the use of &amp;ldquo;nanodome&amp;rdquo; solar cells to simultaneously improve optical absorption and enhance surface cleanliness. The resulting structures have power conversion efficiencies of 5.9%. </description>
			<category>Resources - Expert Reviews</category>
			<pubDate>Mon, 08 Feb 2010 11:56:45 +0100</pubDate>
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			<title>Nanowerk Introduces nanoBIDS</title>
			<link>http://www.internano.org/content/view/355/251/</link>
			<description> Nanowerk, the leading information provider for all areas of nanotechnologies, added to its nanotechnology information portal a new free service for buyers and vendors of micro- and nanotechnology equipment and services. The new application, called nanoBIDS, is now available. nanoBIDS facilitates the public posting of Requests for Proposal (RFPs) for equipment and services from procurement departments in the        micro- and nanotechnologies community. nanoBIDS is open to all research organizations and companies.        </description>
			<category>News - Press Releases</category>
			<pubDate>Thu, 04 Feb 2010 12:16:06 +0100</pubDate>
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			<title>NIST Technology Innovation Program (TIP) Advances Public-Private Partnerships with Strong ...</title>
			<link>http://www.internano.org/content/view/354/251/</link>
			<description> The U.S. Commerce Department&amp;rsquo;s National Institute of Standards and Technology (NIST)  (http://www.nist.gov/index.html) announced in December 2009 over $31 million in funding through its Technology Innovation Program (TIP) (http://www.nist.gov/tip/)  for nine new cost-sharing projects that will support innovative, high-risk research in novel nanomaterials or nanomanufacturing technologies that address critical national needs. TIP is focused on developing new materials based on nanotechnology&amp;mdash;advanced composites and &amp;ldquo;superalloys,&amp;rdquo; or smart materials&amp;mdash;and expanding the capacity to incorporate these materials into new products. The acceleration of advanced nanomaterials and nanomanufacturing is a critical strategy to advance the growth and competitiveness of U.S. manufacturing. </description>
			<category>News - NNN Features</category>
			<pubDate>Tue, 26 Jan 2010 14:55:12 +0100</pubDate>
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