Direct Writing of Ordered Nanostructures with Laser Interference Lithography
Compared to conventional lithographic methods for the preparation of nanostructures, which typically reqire time-consuming process sequences and expensive masks, Laser Interference Lithography (LIL) is an inexpensive and efficient option to produce nanopatterns over large areas.
In a paper recently published in Nanotechnology, Tan and colleagues demonstrate the use of LIL to directly write nanoholes into SiO2-coated GaAs wafers. Their simplified process used a high-energy laser to pattern periodic arrays of holes into the substrate, achieving features sizes of <5nm. Due to its high resolution and low cost, LIL is promising for industrial use.
Surface nanostructures have a range of potential applications from solar cells and magnetic storage to micro- and optoelectronics.
This research was funded by the European Fp6 Project.
- LIL Fabricates High Resolution Nanostructures Fast. Nanotechweb.org [Internet]. [cited 2009 March 20] Available from http://nanotechweb.org/cws/article/tech/38274.
- Tan C, et al. 2009. Ordered Nanostructures Written Directly by Laser Interference. Nanotechnology 20(12): 125303.
Image reproduced with permission from Tan C, et al. 2009. Ordered Nanostructures Written Directly by Laser Interference. Nanotechnology 20(12): 125303. Copyright 2009 Institute of Physics.
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