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Direct Writing of Ordered Nanostructures with Laser Interference Lithography

Written by InterNano
March 20, 2009

Tan Figure 3b
Excerpted AFM image of LIL nanopattern.
National Nanomanufacturing Network: An international team of researchers demonstrates a simplified method of laser interference lithography for ordered surface nanostructures <5nm.


Compared to conventional lithographic methods for the preparation of nanostructures, which typically reqire time-consuming process sequences and expensive masks, Laser Interference Lithography (LIL) is an inexpensive and efficient option to produce nanopatterns over large areas. 

In a paper recently published in Nanotechnology, Tan and colleagues demonstrate the use of LIL to directly write nanoholes into SiO2-coated GaAs wafers. Their simplified process used a high-energy laser to pattern periodic arrays of holes into the substrate, achieving features sizes of <5nm. Due to its high resolution and low cost, LIL is promising for industrial use. 

Surface nanostructures have a range of potential applications from solar cells and magnetic storage to micro- and optoelectronics. 

This research was funded by the European Fp6 Project.

See also

Image reproduced with permission from Tan C, et al. 2009. Ordered Nanostructures Written Directly by Laser Interference. Nanotechnology 20(12): 125303. Copyright 2009 Institute of Physics. 

Last updated: July 27, 2009
 

Tags: Interference lithography, Advanced Processes + Tools

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