Cloning of Devices by Imprint Lithography

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Written by InterNano   
October 09, 2007

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Center for Hierarchical Manufacturing: UMass faculty members Kenneth Carter and Vincent Rotello have developed a nanoimprint molding technique to enable the rapid prototyping of electronic devices. The parent device structure is fabricated using a conventional, expensive and time consuming multi-step top-down process sequence. The desired structure is then non-destructively replicated in an imprint mold. Next the mold is used as a master to reproduce multiple generations of the original structure through a simple, two-step imprinting and etching process. This achievement enables low-cost, rapid prototyping of numerous device structures from one original patterned device.

 

 

 

Last updated: April 01, 2008
 
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