National Nanomanufacturing Network: The July 2 issue of Advanced Materials highlights the work of researchers at the Center for Hierarchical Manufacturing on its cover.
Yuval Ofir, Vince Rotello, and colleagues report a process of creating cationic and anionic polymer templates with electron beam lithography for the electrostatic self-assembly of magnetic, metallic, and semiconducting nanoparticles.
This process successfully integrates bottom-up and top-down techniques for the creation of nanostructures.
Cover image: Copyright Wiley-VCH Verlag GmbH & Co. KGaA. Ofir, Y., et al. Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films. Advanced Materials 2008 20 2561-2566. Reproduced with permission.
