CHM Researchers Featured on Advanced Materials

National Nanomanufacturing Network: The July 2 issue of Advanced Materials highlights the work of researchers at the Center for Hierarchical Manufacturing on its cover.  

Yuval Ofir, Vince Rotello, and colleagues report a process of creating cationic and anionic polymer templates with electron beam lithography for the electrostatic self-assembly of magnetic, metallic, and semiconducting nanoparticles.

This process successfully integrates bottom-up and top-down techniques for the creation of nanostructures. 

Ofir, Y., et al. Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films. Advanced Materials 2008 20 2561-2566.

Cover image: Copyright Wiley-VCH Verlag GmbH & Co. KGaA. Ofir, Y., et al. Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films. Advanced Materials 2008 20 2561-2566. Reproduced with permission.