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Process Database

The InterNano Process Database is a knowledge base of techniques for processing nanoscale materials, devices, and structures that includes step-by-step descriptions, images, notes on methodology and environmental variables, and associated references and patent information.

The purpose of the Process Database is to facilitate the sharing of appropriate process knowledge across laboratories.The processes included here have been previously published or patented.

If you have a published and/or patented process that you would like to include in the InterNano Process Database, you can either contact us and we will add the process for you, or you can register on InterNano and add the process yourself.

Fabrication of a nanoporous template from a diblock copolymer film - solvent annealing

An evaporation-induced flow in solvent cast block copolymer films can produce arrays of nanoscopic cylinders oriented normal to the surface and solvent annealing could markedly enhance the ordering of block copolymer microdomains in thin films. Without removing minor components, solvent-induced surface reconstruction can produce nanoporous structure in thin films. The porous film can be used as a template for deposition of quantum dots or as a mask for pattern transfer to the underneath substrates.

Figure 1
Fabrication of a nanoporous template from a diblock copolymer film - electric field alignment

An applied electric field aligns a cylindrical-phase diblock copolymer perpendicular to a substrate. One polymer block is removed by UV exposure and a chemical rinse to yield a nanoporous polymer film. The porous film can be used as a template for electrodeposition of metal nanowires or as a mask for reactive ion etching.

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