Tuesday September 27, 2011
Atrium-Seaport Convention
- 5:00-6:15 pm Reception/Poster Session for Nanomanufacturing Summit 2011
Workshop Dinner
- 6:30 pm Constitution Room, Seaport Hotel
- 6:40 pm Introductory Remarks and Workshop Objectives – Jeff Morse, NNN
- 6:45 pm Flexible Substrate Nanoanufacturing Roadmap – Dan Gamota, INEMI
- 7:30 pm Roll-to-Roll Manufacturing of Nanostructured Materials and Devices – James Watkins, CHM/UMass
- 8:00 pm High Temperature Roll to Roll Processes – Amit Goyal, Oak Ridge National Lab
Wednesday September 28, 2011
Skyline Room, Seaport Convention Center
- 7:30-8:30 am Breakfast
- 8:30 Ken Carter – CHM/UMass Amherst
R2R NIL and Coatings “Bringing Bottom-Up to Roll-to-Roll” - 8:55 Nikolaos Kehagias, Catalan Institute of Nanotechnology
Nanofabrication Technologies: From Parallel to Continuous R2R Nano-manufacturing - 9:20 Jay Guo – University of Michigan
R2R Nanomanufacturing Processes for Solar Cell and Display Applications - 9:45 Jennifer Ernst – Thin Film Electronics ASA
Printed Electronic Devices: Experience at the Frontline - 10:10 Robert Praino – Chasm Technologies
Bridging the Nanotech Gap: Challenges for “Lab to Fab” → Roll-to-Roll? - 1030 Break
- 10:50 Rick Daniels – Carestream
Nanometer Functionality Delivered by the Meter - 11:15 Dennis Slafer – Microcontinuum
What exactly is R2R Nanomanufacturing? - 11:40 Trevor Niblock – Magzor, Inc.
Magzor – MESO Fabrication - 12:05 Michael Hunter – Liquidia Technologies
- 12:30 Lunch and Group Discussions
- 1:00 Dan Gamota, IPC, Standards Initiatives
IPC Printed Electronics Standards Development Initiative - 1:15 Ganesh Sundaram, Cambridge Nanotech, Inc.
Advances in ALD Methods for Roll-to-Roll (R2R) Applications - 1:40 Hong-Yee Low – AStar/IMRE
Roll to Roll Nanoimprint Technology for Functional Films - 2:05 Mark Poliks – Center for Advanced Microelectronics Manufacturing (CAMM)
Toolset to Address Manufacturing Opportunities and Challenges of Roll-to-Roll Fabrication of Advanced Electronic Interconnects - 2:30 S.V. Sreenivasan – University of Texas Austin/Molecular Imprints
Inkjet Based Roll-to-Roll Nanoimprinting - 2:55 Dr. Du Xian – MIT
Metrology and Inspection for Process Control for Roll-to-Roll and Transparent Substrates - 3:20 Joe Petrzelka, MIT
Scaleup of Soft Lithography to R2R Technology: Modeling and Control of the Contact Region - 3:40 Discussions and Readout of Key Challenges, Issues
- 5:00 Adjourn
