Atomic layer deposition (ALD)
process of fabricating uniform conformal films through the cyclic deposition of material through self-terminating surface reactions that enable thickness control at the atomic scale [SOURCE: ISO/TS 80004-8 v1, 7.2.2]
ALD NanoSolutions helps our customers accelerate their product innovation. Our proprietary Particle ALD coating technology, which can apply designed coatings at the nanometer scale on particles of any size, creates enormous commercial opportunity for new materials development and integration. In addition, Polymer ALD forms nanocoatings on polymer films, where we are developing continuous roll to roll ALD coating capability. ALD NanoSolutions’ multi-layer ALD films will fundamentally shift commercial polymer coating processes to lower cost, higher performance films.
pplied Materials, Inc. is the global leader in Nanomanufacturing Technology solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel displays, solar photovoltaic cells, flexible electronics and energy efficient glass.
The NIST Center for Nanoscale Science and Technology (CNST) is a national user facility with a focus on commerce, supporting the U.S. nanotechnology enterprise from discovery to production by providing industry, academia, and other government agencies with access to world-class nanoscale measurement and fabrication methods and technology. The CNST's shared-use NanoFab gives researchers access to and training on a state-of-the-art tool set required for cutting-edge nanotechnology development. A simple application process is designed to get work started in a few weeks.