For nanotech products to achieve the broad impacts envisioned, they must be manufactured in market-appropriate quantities in a reliable, repeatable, and commercially viable manner. In addition, they must be manufactured so that environmental and human health concerns are met, worker safety issues are appropriately assessed and handled, and liability issues are addressed. Critical to this realization of robust nanomanufacturing is the development of the necessary instrumentation, metrology, and standards.
The Instrumentation, Metrology, and Standards for Nanomanufacturing IV conference is co-chaired by Mike Postek, National Institute of Standards and Technology, and John Allgair, International SEMATECH Manufacturing Initiative.
Criteria for abstract peer review and rating will include contribution to scientific understanding, relevance and interest to the nanomanufacturing community, and lack of advertisements. Submitted papers must concentrate on the underlying technologies and methods, not on product marketing. Abstracts in the following areas will be considered:
- nanomanufacturing methodologies
- metrology and inspection methodologies
- high resolution optics, including full-field, near-field and scanned microscopy, catterometry, and interferometric techniques,
- particle beam (electron, ion), including scanned microscopy and elemental analysis
- atomic force microscopy
- limits of metrology and inspection systems
- regional alliances/clusters for nanomanufacturing
- dimensional metrology for nanomanufacturing
- new metrology requirements for nanomanufacturing
- new instrumentation needed for nanomanufacturing
- characterization metrologies and novel measurement techniques
- process control, characterization, and yield enhancement
- process optimization, monitoring, and quality assurance and reliability
- integration, interoperability, and information management
- calibration for metrology tools linewidth, pitch standards, and reference materials
- reference measurement systems, traceability and metrology comparisons
- instrument resolution
- tool matching
- estimation of total measurement error, including precision and accuracy
- environmental, health and safety monitoring and metrology
- environmental contamination and its measurement
- focused ion beam for nanomanufacturing and metrology
- milling, imaging and 3-D metrology
- measurement system modeling and simulation
- physics of the metrology processes, system-sample interaction
- models of systems and samples: characterization and model parameters
- predictive modeling: combining experimental and simulated data
- novel data analysis methods, library-based image analysis, and algorithms
- sampling strategies
- systems integration
- novel application of statistical data analysis methods in manufacturing
- process integration of image recording and transfer, etch, and deposition
- metrology and related functional testing through self-test in systems-on-a-chip
Submission deadline is January 18, 2010. Read their full submission guidelines, and submityour abstract today!
