Dry-ashing
form of chemical etching in which surface material is spontaneously etched by a neutral or activated gas and forms volatile etch products [SOURCE: ISO/TS 80004-8 v1, 7.3.8]
form of chemical etching in which surface material is spontaneously etched by a neutral or activated gas and forms volatile etch products [SOURCE: ISO/TS 80004-8 v1, 7.3.8]
This project is supported by the National Science Foundation CMMI-1025020
Center for Hierarchical Manufacturing