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Volume
2 Issue 6 - July 2009 |
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The NNN Newsletter
In this month's newsletter we are posting the first in a series of system level nanomanufacturing test-bed reviews. System level test-beds are public-private partnerships designed to transfer promising fundamental discoveries and developments from the research laboratory to viable manufacturing platforms that can be adopted by industry. The NNN is taking a close look at some of these collaborations from our affiliate research centers, providing summary details of approach and impact for potential stakeholders and future partnerships of similar focus. Regards, Learn More about the
Progress
Towards High-Throughput Continuous Nanoimprinting
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Upcoming Events July 26 - 30, 2009 July 26 - 30, 2009 July 26 - August 1, 2009 July 28 - 31, 2009
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Recently Published Robust and Responsive Dendrimer-Gold Nanoparticle Nanocomposites via Dithiocarbamate Crosslinking Hydrophobicity of Perfluoroalkyl Isocyanate Monolayers on Oxidized Aluminum Surfaces Magnetic Transitions in Ultra-Small Nanoscopic Magnetic Rings: Theory and Experiments A Model-Based Methodology for On-Line Quality Control Join us on |
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The National Nanomanufacturing Network Newsletter Subscribe / Unsubscribe from this list. Our mailing address is: The National Nanomanufacturing Network 322 Lederle Graduate Research Center 710 N. Pleasant Street University of Massachusetts Amherst, MA 01003 Our email address is: nnn@nanomanufacturing.org Our phone number is: (413) 577-0570 Copyright (C) 2008 The National Nanomanufacturing Network All rights reserved. Supported by the National Science Foundation under Grant No. DMI-0531171.  |
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Self-Assembled Polymer Templates for Device Fabrication: High-Rate and Low-Cost for Roll-to-Roll Processing
Nanoimprint
lithography (NIL) has emerged as a leading candidate for high throughput,
high resolution nanoscale patterning for devices such as flat panel
displays, photonics, or organic optoelectronics. Growing interest
in integrated nanomanufacturing on flexible substrates for these
and related applications underscores the need to develop rapid throughput
NIL techniques conducive with continuous roll-to-roll processes.
Ahn, et. al., describe a process for large-area Roll-to-Roll and
Roll-to-Plate nanoimprint lithography that represents a significant
step towards integration of emerging nanomanufacturing techniques
with high throughput production infrastructure. 
Researchers at the Lawrence Berkeley National Laboratory and the University of California Berkeley report advances in the fabrication of cost-effective photovoltaics based on bottom-up nanostructured materials. Their model offers a versatile path to the manufacture of low-cost solar modules.
The thin film transistor (TFT) has been developed over the past two decades for applications in large area devices, most notably displays. The predominant technology has been hydrogenated amorphous silicon. Recent developments in organic TFTs over the past decade offer low-cost alternatives when combined with large area printing and fabrication methods. Moreover, with a new emphasis on large area, flexible substrates for emerging applications--such as flexible displays and e-paper—low -temperature, low-cost, large-area processes are gaining significant momentum.
