Conference
Monday, March 21, 2011 - 1:00am to Wednesday, March 23, 2011 - 1:00am
This conference—which brings together the leading researchers from the semiconductor industry and the university community—focuses on advanced wafer and mask cleaning and surface preparation technologies. Speakers and participants will explore current developments and ITRS challenges in wafer and mask cleaning, including wafer front-end, wafer back-end, advanced mask, and environment, safety and health issues for the 16 nm node and beyond.