Skip to content Skip to navigation

Reactive ion etching (RIE)

form of plasma etching (7.3.18) in which the wafer is placed on a radio-frequency-driven electrode and the counter electrode has a larger area than the driven electrode [SOURCE: ISO/TS 80004-8 v1, 7.3.20]

Center for Nanoscale Science and Technology
Center for Nanoscale Science and Technology
100 Bureau Drive, MS 6200 Gaithersburg, MD 20899-6200 USA

The NIST Center for Nanoscale Science and Technology (CNST) is a national user facility with a focus on commerce, supporting the U.S. nanotechnology enterprise from discovery to production by providing industry, academia, and other government agencies with access to world-class nanoscale measurement and fabrication methods and technology. The CNST's shared-use NanoFab gives researchers access to and training on a state-of-the-art tool set required for cutting-edge nanotechnology development. A simple application process is designed to get work started in a few weeks.