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Deposition of Nanostructured Films or Nanostructures

Chip schematic. (a) illustrates the bias electrode used for applying the bias potential from the arbitrary function generator and the counter electrodes, which are capacitively coupled to the conductive substrate except for one, which is directly coupled to the ground. Inset (b) shows in detail the finger electrodes in yellow, over which the two-dimensional graphene nanostructures will bridge. The cross section of the finger electrode gap is depicted in (c). Reprinted from Burg BR, Lutolf F, Schneider J, Schirmer NC, Schwamb T, Poulikakos D. 2009. High-yield dielectrophoretic assembly of two-dimensional graphene nanostructures. Applied Physics Letters. 94(5). Permission pending.
High-yield dielectrophoretic assembly of two-dimensional graphene nanostructures

The serial mechanical exfoliation method available can not be used for the assembly of graphene in the large scale. In this process, deposition of ultrathin few-layer (three to ten) graphene oxide, with parallel and controllable assembly, by dielectrophoresis between prefabricated electrodes has been demonstrated.

Dotted line: electrode potential, solid line: current, dashed line: EQCM frequency change
Pulse-reversed electrodeposition with QCM monitoring to make magnetic nanowires in a nanotemplate

Cobalt nanowires with high perpendicular magnetic anisotropy are formed in a diblock copolymer film template using a pulse-reversed voltage with QCM monitoring.  This in situ monitoring system along with the pulse-reversed field enables new control over the magnetic crystal growth.